The RTP-3000 System
An Advanced Rapid Thermal Processing System with Multi-Gas Capabilities
The RTP-3000 is a fully automated production system. The system with a 200mm chamber is capable of up to 6" Compound Semiconductor, or with a 300mm chamber up to 12" Silicon wafer processing.Click here for photo image of RTP-3000 compound semiconductor configuration
The RTP-3000 System features a loop temperature control algorithim with a temperature control stability of +/- 2 deg. C from set point. This feature greatly simplifies programming complex multi-step cycles, since no "tweaking" of system variables is required. The Lamp Calibration feature allows user-optimization of heating uniformity. Software diagnostics are provided to monitor each lamp and compensate for lamp aging effects.
An integrated software package has been developed to control the RTP-3000 System. The software modules interactively serve to integrate the various functions and operations of this system. Software features allow convenient recipe creation and editing. Process data may be collected during a run cycle and stored in a data file for later display and analysis. The process and recipe data files can be internally stored as DIF (Data Interchange Format) which can be imported into popular software packages such as Lotus 1-2-3, as a worksheet for display, plotting and further analysis.
RTP-3000 Software Features